Photo-electronic Measurement of Film Thickness for the Sulphonation of Methyl Esters in Falling Film Reactors

Authors

  • Luis Diaz Ohio University
  • Hugo Zea Universidad Nacional de Colombia
  • Francisco Sanchez Universidad Nacional de Colombia

Keywords:

Film thickness, Falling film reactors, optical sensors

Abstract

An optical-electronic system was developed for the determination of film thicknesses in falling film reactors and applied to the analysis of methyl esters sulphonation. Calibration and experimental tests were performed to obtain a correlation between the film thickness (d ) and the measured Voltage (V) of the photo electronic cell. Voltage sensing and film thickness calculations were found to be highly dependent on the position of the sensing device from the reactor inlet and slightly dependant on the gas flow rate under the range of experimental values tested. This optical-electronic system allows a real-time quantitative description of the dynamic behavior of the undulations in the falling film.


Author Biography

Francisco Sanchez, Universidad Nacional de Colombia

References

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Published

2014-10-15

How to Cite

Diaz, L., Zea, H., & Sanchez, F. (2014). Photo-electronic Measurement of Film Thickness for the Sulphonation of Methyl Esters in Falling Film Reactors. Asian Journal of Applied Sciences, 2(5). Retrieved from https://ajouronline.com/index.php/AJAS/article/view/952

Issue

Vol. 2 No. 5 (2014): October 2014

Section

Articles

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