SOEGIJONO, B.; SUSETYO, F. B.; SITUMORANG, E. U. M.; YUSMANIAR. Effect of Current Density on Crystallographic Orientation, and Oxidation Behavior of Copper Plated on Aluminum Substrate. Asian Journal of Applied Sciences, [S. l.], v. 8, n. 4, 2020. DOI: 10.24203/ajas.v8i4.6287. Disponível em: https://ajouronline.com/index.php/AJAS/article/view/6287. Acesso em: 21 nov. 2024.